litmus open call: parts 4 & 5 – Oriel Davies

Litmus  is an exhibition and development programme offering curatorial and practical support for five early career artists based in Wales and the Welsh Borders to research, develop and present new work at Oriel Davies.

Artists are invited to submit applications for either part 4: Litmus Residency or part 5: Litmus Commission.

Litmus is based in our third exhibition space, which is a small yet adaptable space that measures 158cm (w) x 212cm (l) x 219cm (h). Whilst we’re anchoring the programme here, artists are encouraged to submit applications that consider other spaces/places in Oriel Davies (whether physical or digital), and the surrounding area.

Artists are encouraged to submit applications showing ambition, experimentation and creative risk taking as part of a commitment to developing their creative practice.

What’s on Offer?

Litmus Residency

You are invited to propose how, through this opportunity, you might open out an area of research or a new aspect, project or development within your practice. The Litmus Residency is an opportunity for time and space to explore emergent strands of practice.

• A residency based from our third exhibition space. Residency dates: 09 December 2017-27 January 2018.
• Curatorial and practical dialogue and support from Litmus Curator Louise Hobson, Oriel Davies Curator Alex Boyd Jones and the wider gallery team.
• A fee of £600 and an additional budget of £400 for travel, accommodation and expenses.

Litmus Commission

You are invited to propose how, through this opportunity, you might crystallise your current research, focus your practice and develop new work. The Litmus Commission is an opportunity to test out an idea and bring into reality the next stage of your practice.

• An exhibition in our third exhibition space. Exhibition dates: 10 February-11 April 2018.
• Curatorial and practical dialogue and support from Litmus Curator Louise Hobson, Oriel Davies Curator Alex Boyd Jones and the wider gallery team.
• A fee of £600 and an additional budget of £400 for production, materials and expenses.

Who Can Apply?

• Artists based in Wales and the Welsh Borders – Litmus aims to support artists from a wide geographic spread across Wales and the bordering Counties (Cheshire, Shropshire, Herefordshire, Gloucestershire).
• As an organisation that seeks to support artists from all backgrounds, Oriel Davies welcomes applications from BAME artists and also those artists who identify as disabled.
• Artists making work in any media – Litmus aims to support artists with a range of practices and artistic approaches.
• Early career artists – selected artists will be in the process of establishing their creative/professional practice.
• We are looking for those who will benefit the most from the Litmus Programme and the support and dialogue on offer.

How to Apply
Please apply by downloading and completing the Litmus Open Call Parts 4 & 5 Application Form, which asks for the following:

• Tell us whether you are applying for the Litmus Commission or the Litmus Residency.
• Introduce yourself and your practice (max 200 words)
• Outline how you propose to use this opportunity including ideas and starting points (max 400 words)
• Tell us what informs your practice, how this project may enable you to develop your practice and support your personal and/or professional development (max 400 words)
• Attach your CV (max two pages A4)
• Attach one PDF of up to 6 images and/or up to four web links (to sound files or videos) to show examples of your work
• Download, complete and attach our Equal Opportunities Monitoring Form 

Key Dates

• Closing date for applications: Thursday 05 October, 10pm
• Artists notified of interview: Thursday 12 October 2017
• Artist interviews at Oriel Davies, Newtown: Wednesday 18 October 2017
• Successful artists notified: Friday 20 October 2017

Completed applications and additional material should be emailed to: Louise Hobson litmus@orieldavies.org with the subject line: Litmus Application Parts 4 & 5

Downloads:

Litmus Open Call: Parts 4 & 5 Info Sheet
Application Form
Equal Opportunities Form